Savina Minimax无尘布 超细无尘布
产品简介
Savina Minimax无尘布是日本KBSEIREN株式會社(原KANEBO)開發的目前***的無塵擦拭布系列產品,吸水吸油性極強,不磨損原件。廣氾用於光學鏡頭製造,辦公器材保養,10級以上的無塵車間淨化室,半導體生產線車間等領域。
产品详细信息
Savina Minimax无尘布
日本KANEBO公司生產的HITECLOTH 超細纖維無塵布是由Belima.X織成,其不規則的纖維排布組成適用於各種不規則物體的細微表面處理,不會掉絨毛,超柔軟布質及高度抗磨損特性可應用於精密儀器之保養。
用途:清洁擦拭LCD,偏光片,背光源模组,镜头,光学镜头镜片,光纤,半导体,PCB,FPC,印刷电路板清洁,数码相机清洁涂装擦拭,医药生产,电影胶片清洁,精密器件,半导体,集成电路,视频,磁盘,硬盘,软盘,光盘,触摸屏,显示屏,显示器等清洁!
适用级别:10-100级无尘车间使用
规格:24CM*24CM
包装:100片/包
High technology fields are growing every day in sophistication and precision. Highly efficient wiping cloths are essential for a strict dust-free environment in the manufacturing of such products as LSIs and LCDs. Savina Minimax was created to readily meet the needs of the times, with excellent functions enough to cope with the ultimate dust-free condition in super clean rooms.
Wipers for use in clean rooms should clean all instruments, apparatuses and peripheral devices while causing no contamination. They are also required to absorb and remove any undesired moisture. Savina Minimax, which contains all properties needed for such wipers, is one of the highest-performance wiping cloths designed for the age of high technology.
After knitting, the greige for Savina Minimax is shrunken lengthwise and widthwise with the proprietary technology of KB SEIREN, in order to achieve an extremely dense construction. The fine filaments on the wiping cloth surface, as many as 82,550/sq.cm, ensure the fail-safe entrapment of dust.
Cross-sectional photo
Surface photo
Material Description
A knit-type wiping cloth of 100% Belima X to cope with the super dust-free environment
Excellent Features
Generates a negligible amount of lint
Excels in water absorbency and retention
Has minimum dissolution of residual ions and other substances
Provides superb wiper performance (removes dirt and prevents reattachment)
Generate only a minuscule amount of lint.
Absorb and retain water quickly and positively.
Have lower dissolution of residual ions, etc.
provide high wiperperformance(when used in clean rooms, wipers need to
remove a maximum amount of dust without contaminating the clean room
equipment.)
◆APPLICATIONS◆
Production processes for photomegnetic disks, hard disks, and floppy disks
Production processes for deflection plates of liquid crystals, etc
Compact and magnetic disk production processes
Video deck production processes
Contact lens production processes
Camera assembly lines
Printed circuit board cleaning processes
Cleaning processes for camera lenses before coating
Medicine production processes
Movie film cleaning processes
Production processes for semiconductors and integrated circuits
Workpiece cleaning process before precision coating
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